Crystallographic structure and ferroelectricity of epitaxial hafnium oxide thin films
Author:
Funder
National Research Foundation of Korea
Gachon University
Publisher
Springer Science and Business Media LLC
Subject
Ceramics and Composites
Link
https://link.springer.com/content/pdf/10.1007/s43207-021-00171-z.pdf
Reference137 articles.
1. K. Roy, S. Mukhopadhyay, H. Mahmoodi-Meimand, Leakage current mechanisms and leakage reduction techniques in deep-submicrometer CMOS circuits. Proc. IEEE. 91(2), 305 (2003)
2. J. Robertson, R.M. Wallace, High-K materials and metal gates for CMOS applications. Mater. Sci. Eng. 88, 1 (2015)
3. T. Böscke, J. Müller, D. Bräuhaus, U. Schröder, U. Böttger, Ferroelectricity in hafnium oxide thin films. App. Phy. Lett. 99(10), 102903 (2011)
4. J.M. Khoshman, M.E. Kordesch, Optical properties of a-HfO2 thin films. Surf. Coat. Technol. 201(6), 3530 (2006)
5. M. Trentzsch, S. Flachowsky, R. Richter, J. Paul, B. Reimer, D. Utess, S. Jansen, H. Mulaosmanovic, S. Müller and S. Slesazeck: A 28nm HKMG super low power embedded NVM technology based on ferroelectric FETs, in 2016 IEEE International Electron Devices Meeting (IEDM), (IEEE, City, 2016), pp. 11.5. 1.
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Fabrication and characterization of HfxAl(1-x)Oy ceramic targets and thin films by RF sputtering;Ceramics International;2024-09
2. Silicon Atomic-Layer Doped Hf₀.₇Zr₀.₃O₂ Films: Toward Low Coercive Field (0.64 MV/cm) and High Endurance (>10¹² Cycles);IEEE Transactions on Electron Devices;2024-07
3. Exploring the role of TiN electrodes in the formation of ferroelectric HfxZr1-xO2 thin films through transmission electron microscopy;Journal of the Korean Ceramic Society;2024-01-23
4. Harnessing point-defect induced local symmetry breaking in a tetragonal-HfO2 system through sterically mismatched ion doping;Journal of Materials Chemistry C;2024
5. Flexoelectric effect via piezoresponse force microscopy of domain switching in epitaxial PbTiO3 thin films;Journal of the Korean Ceramic Society;2023-10-17
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3