Substrate Biasing Effect on the Physical Properties of Reactive RF-Magnetron-Sputtered Aluminum Oxide Dielectric Films on ITO Glasses
Author:
Affiliation:
1. Division of Functional Materials and Nano Devices, Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, People’s Republic of China
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am4055589
Reference37 articles.
1. Review and Perspective of Hf-based High-kGate Dielectrics on Silicon
2. Effect of metal contacts on the electrical characteristics of Al2O3 dielectric thin films
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4. Influence of the substrate bias voltage on the physical properties of dc reactive sputtered Ta2O5 films
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