Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal–Insulator–Metal Capacitors-Reference-Cited by-同舟云学术

Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal–Insulator–Metal Capacitors

Published:2013-03-11 Issue:6 Volume:25 Page:953-961
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Lee Woongkyu¹,Han Jeong Hwan¹,Jeon Woojin¹,Yoo Yeon Woo¹,Lee Sang Woon¹,Kim Seong Keun¹,Ko Chang-Hee²,Lansalot-Matras Clement²,Hwang Cheol Seong¹

Affiliation:

1. WCU Hybrid Materials Program, Department of Materials Science and Engineering and Interuniversity Semiconductor Research Center, Seoul National University, Seoul 151-744, Korea

2. Air Liquide, 28, Wadai, Tsukuba-Shi, Ibaraki Pref., 300-4247, Japan

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm304125e

Reference20 articles.

1. Capacitors with an Equivalent Oxide Thickness of <0.5 nm for Nanoscale Electronic Semiconductor Memory

2. New TIT capacitor with ZrO2/Al2O3/ZrO2 dielectrics for 60nm and below DRAMs

3. Growth of Conductive SrRuO3 Films by Combining Atomic Layer Deposited SrO and Chemical Vapor Deposited RuO2 Layers

4. Atomic Layer Deposition of SrTiO3 Thin Films from a Novel Strontium Precursor-Strontium-bis(tri-isopropyl cyclopentadienyl)

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