SrTiO3 and (Ba,Sr)TiO3 Films Epitaxially Grown on SrRuO3 Using Atomic Layer Deposition
Author:
Affiliation:
1. Samsung Advanced Institute of Technology, Samsung Electronics, Suwon-si, Gyeonggi-do 16678, Republic of Korea
2. Advanced Process Development Team, Semiconductor R&D Center, Samsung Electronics, Hwaseong-si, Gyeonggi-do 18448, Republic of Korea
Publisher
American Chemical Society (ACS)
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.4c10400
Reference38 articles.
1. High dielectric constant oxides
2. Capacitors with an Equivalent Oxide Thickness of <0.5 nm for Nanoscale Electronic Semiconductor Memory
3. Process–property relationship in high-k ALD SrTiO3 and BaTiO3: a review
4. Thickness Dependence of the Dielectric Properties of Epitaxial SrTiO3Films on (001)Pt/SrTiO3
5. Fabrication and electrical properties of (111) textured (Ba0.6Sr0.4)TiO3 film on platinized Si substrate
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