Nucleation and Initial Stages of Growth during the Atomic Layer Deposition of Titanium Oxide on Mesoporous Silica-Reference-Cited by-同舟云学术

Nucleation and Initial Stages of Growth during the Atomic Layer Deposition of Titanium Oxide on Mesoporous Silica

Published:2020-08-25 Issue:9 Volume:20 Page:6884-6890
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Ke Wang¹,Liu Yang²,Wang Xuelong³,Qin Xiangdong¹,Chen Limei¹,Palomino Robert M.³^ORCID,Simonovis Juan Pablo³⁴,Lee Ilkeun¹,Waluyo Iradwikanari⁴^ORCID,Rodriguez José A.³^ORCID,Frenkel Anatoly I.²³^ORCID,Liu Ping³^ORCID,Zaera Francisco¹^ORCID

Affiliation:

1. Department of Chemistry, University of California, Riverside, California 92521, United States

2. Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794, United States

3. Chemistry Division, Brookhaven National Laboratory, Upton, New York 11973, United States

4. National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11973, United States

Funder

Basic Energy Sciences

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.nanolett.0c02990

Reference42 articles.

1. Conformality in atomic layer deposition: Current status overview of analysis and modelling

2. New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition

3. Atomic Layer Deposition: An Overview

4. Atomic Layer Deposition

5. Understanding chemical and physical mechanisms in atomic layer deposition

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