Direct-Write X-ray Nanopatterning: A Proof of Concept Josephson Device on Bi2Sr2CaCu2O8+δ Superconducting Oxide-Reference-Cited by-同舟云学术

Direct-Write X-ray Nanopatterning: A Proof of Concept Josephson Device on Bi2Sr2CaCu2O8+δ Superconducting Oxide

Published:2016-02-03 Issue:3 Volume:16 Page:1669-1674
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Truccato Marco¹,Agostino Angelo²,Borfecchia Elisa²,Mino Lorenzo³,Cara Eleonora¹,Pagliero Alessandro¹,Adhlakha Nidhi¹,Pascale Lise²,Operti Lorenza²,Enrico Emanuele³,De Leo Natascia³,Fretto Matteo³,Martinez-Criado Gema⁴,Lamberti Carlo²⁵

Affiliation:

1. Department of Physics, Interdepartmental Centre NIS, University of Torino, via Giuria 1, I-10125 Torino, Italy

2. Department of Chemistry, Interdepartmental Centre NIS and INSTM Centro di Riferimento, University of Torino, via Giuria 7, I-10125 Torino, Italy

3. INRIM, National Institute for Metrological Research, Strada delle Cacce 91, I-10135 Torino, Italy

4. Experiments Division, European Synchrotron Radiation Facility, 71 Avenue des Martyrs, 38000 Grenoble, France

5. Southern Federal University, Zorge Street 5, 344090 Rostov-on-Don, Russia

Funder

Compagnia di San Paolo

Ministry of Education and Science of the Russian Federation

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.nanolett.5b04568

Reference42 articles.

1. Nanolithography in microelectronics: A review

2. Design and manufacturability tradeoffs in unidirectional and bidirectional standard cell layouts in 14 nm node

3. Sub-10 nm patterning using EUV interference lithography

4. Resist Materials and Processes for Extreme Ultraviolet Lithography

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