X-ray Photoelectron Spectroscopy Equipped with Gas Cluster Ion Beams for Evaluation of the Sputtering Behavior of Various Nanomaterials
Author:
Affiliation:
1. Analytical Laboratory, ULVAC-PHI, Inc. 2500 Hagisono, Chigasaki, Kanagawa 253-8522, Japan
2. Department of Photonics, National Sun Yat-Sen University, No. 70, Lianhai Road, Gushan District, Kaohsiung City 804, Taiwan
Funder
Ministry of Science and Technology, Taiwan
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsanm.2c00202
Reference36 articles.
1. X
2. Martin, P. M. Handbook of Deposition Technologies for Films and Coatings; Elsevier, 2010 ; pp 727–725.
3. Effects of the temperature and beam parameters on depth profiles in X-ray photoelectron spectrometry and secondary ion mass spectrometry under C60+–Ar+ cosputtering
4. Effect of energy per atom (E/n) on the Ar gas cluster ion beam (Ar-GCIB) and O2+ cosputter process
5. Sputter-induced chemical transformation in oxoanions by combination of C60+ and Ar+ ion beams analyzed with X-ray photoelectron spectrometry
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