Atomic Layer Deposition of Molybdenum Oxides with Tunable Stoichiometry Enables Controllable Doping of MoS2

Author:

Moody Michael J.1,Henning Alex1ORCID,Jurca Titel2ORCID,Shang Ju Ying1,Bergeron Hadallia1,Balla Itamar1ORCID,Olding Jack N.3ORCID,Weiss Emily A.12ORCID,Hersam Mark C.1245ORCID,Lohr Tracy L.2,Marks Tobin J.12ORCID,Lauhon Lincoln J.1ORCID

Affiliation:

1. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States

2. Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States

3. Graduate Program in Applied Physics, Northwestern University, Evanston, Illinois 60208, United States

4. Department of Medicine, Northwestern University, Evanston, Illinois 60208, United States

5. Department of Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208, United States

Funder

Division of Emerging Frontiers in Research and Innovation

National Institute of Standards and Technology

Deutsche Forschungsgemeinschaft

Natural Sciences and Engineering Research Council of Canada

Northwestern University

National Science Foundation

Division of Materials Research

International Institute for Nanotechnology, Northwestern University

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

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