Dry-Etchable Molecular Layer-Deposited Inhibitor Using Annealed Indicone Film for Nanoscale Area-Selective Deposition-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Dry-Etchable Molecular Layer-Deposited Inhibitor Using Annealed Indicone Film for Nanoscale Area-Selective Deposition

Published:2021-12-08 Issue:50 Volume:13 Page:60144-60153
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Lee Seunghwan¹^ORCID,Kim Hye-Mi¹,Baek GeonHo²,Park Jin-Seong¹²^ORCID

Affiliation:

1. Division of Materials Science and Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 04763, Republic of Korea

2. Division of Nano-Scale Semiconductor Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 04763, Republic of Korea

Funder

Korea Semiconductor Research Consortium

Ministry of Science and ICT, South Korea

Hanyang University

Ministry of Trade, Industry and Energy

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.1c16112

Reference43 articles.

1. Considerations for Ultimate CMOS Scaling

2. Extreme ultraviolet lithography: overview and development status

3. Xie, R.; Montanini, P.; Akarvardar, K.; Tripathi, N.; Haran, B.; Johnson, S.; Hook, T.; Hamieh, B.; Corliss, D.; Wang, J. A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels; 2016 IEEE International Electron Devices Meeting (IEDM); IEEE, 2016; pp 2.7.1–2.7.4.

4. From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Understanding the stability of advanced inorganic-organic hybrid thin films for advanced resist applications;Advances in Patterning Materials and Processes XLI;2024-04-09

2. Self-Assembled Monolayers for Interfacial Engineering in Solution-Processed Thin-Film Electronic Devices: Design, Fabrication, and Applications;Chemical Reviews;2024-02-29

3. Review of molecular layer deposition process and application to area selective deposition via graphitization;Japanese Journal of Applied Physics;2023-04-21

4. Growth behavior and substrate selective deposition of polypyrrole, polythiophene, and polyaniline by oxidative chemical vapor deposition and molecular layer deposition;Journal of Vacuum Science & Technology A;2022-12

5. Thermally Annealed Molecular Layer‐Deposited Indicone: Structural Analysis and Area Selective Deposition Application;Advanced Materials Interfaces;2022-09-20

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3