Thermally Annealed Molecular Layer‐Deposited Indicone: Structural Analysis and Area Selective Deposition Application-Reference-Cited by-同舟云学术

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Thermally Annealed Molecular Layer‐Deposited Indicone: Structural Analysis and Area Selective Deposition Application

Published:2022-09-20 Issue:32 Volume:9 Page:2201411
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv Materials Inter

Author:

Lee Seunghwan¹,Baek GeonHo²,Yang Hae Lin¹,Ngoc Van Tran Thi³,Kim Seung‐Woo⁴,Kim Young‐Kwan⁴,Shong Bonggeun³,Park Jin‐Seong¹^ORCID

Affiliation:

1. Division of Materials Science and Engineering Hanyang University 222 Wangsimni‐ro, Seongdong‐gu Seoul 04763 Republic of Korea

2. Division of Nano‐Scale Semiconductor Engineering Hanyang University 222 Wangsimni‐ro, Seongdong‐gu Seoul 04763 Republic of Korea

3. Department of Chemical Engineering Hongik University 94 Wausan‐ro, Mapo‐gu Seoul 04066 Republic of Korea

4. Department of Chemistry Dongguk University‐Seoul 90 Pildong‐ro, Jung‐gu Seoul 04620 Republic of Korea

Funder

Ministry of Trade, Industry and Energy

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.202201411

Reference36 articles.

1. Vertical GAAFETs for the Ultimate CMOS Scaling

2. Lithography at EUV wavelengths

3. Area-Selective Deposition: Fundamentals, Applications, and Future Outlook

4. From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Review of molecular layer deposition process and application to area selective deposition via graphitization;Japanese Journal of Applied Physics;2023-04-21

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