Electronic Structure Differences in ZrO2 vs HfO2
Author:
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp053593e
Reference38 articles.
1. Structure and stability of ultrathin zirconium oxide layers on Si(001)
2. High-κ gate dielectrics: Current status and materials properties considerations
3. Thermal stability of ultrathin ZrO2 films prepared by chemical vapor deposition on Si(100)
4. Band offsets of wide-band-gap oxides and implications for future electronic devices
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