Thermal stability of ultrathin ZrO2 films prepared by chemical vapor deposition on Si(100)
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1339994
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1. Process and Manufacturing Challenges for High-K Gate Stack Systems
2. Ultrathin TiO2 Gate Dielectric Formation by Annealing of Sputtered Ti on Nitrogen Passivated Si Substrates in Nitric Oxide Ambient
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