Size Dependent Effects in Nucleation of Ru and Ru Oxide Thin Films by Atomic Layer Deposition Measured by Synchrotron Radiation X-ray Diffraction
Author:
Affiliation:
1. Department of Chemical Engineering, Stanford University, Stanford, California 94035, United States
2. Fairview Associates, Woodside, California 94062, United States
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm401585k
Reference33 articles.
1. Ruthenium Thin Films Grown by Atomic Layer Deposition
2. Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O[sub 2]
3. Epitaxial growth of RuO2 thin films by metal-organic chemical vapor deposition
4. Surface Chemistry of Ruthenium Dioxide in Heterogeneous Catalysis and Electrocatalysis: From Fundamental to Applied Research
5. Texture of atomic layer deposited ruthenium
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