Precursor design and cascade mechanism of RuO2·xH2O atomic layer deposition-Reference-Cited by-同舟云学术

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Precursor design and cascade mechanism of RuO2·xH2O atomic layer deposition

Published:2024-06 Issue: Volume:657 Page:159728
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Wang Yongjia,Bai Chenqi,Zhao Yongxiao,Zhu Yuanyuan,Li Jing,Xu Lina,Xiao Hongping,Shi Qian,Ding Yihong,Li Aidong,Fang Guoyong

Funder

National Natural Science Foundation of China

Zhejiang Province Natural Science Foundation

National Laboratory of Solid State Microstructures

Publisher

Elsevier BV

Reference67 articles.

1. Nanostructures and Nanomaterials: Synthesis, Properties, and Applications;Cao,2011

2. Introduction to Nanomaterials and Devices;Manasreh,2012

3. D. Vollath, Nanomaterials: An Introduction to Synthesis, Properties and Applications, Second Edition, Wiley-VCH, 2013.

4. Handbook of Semiconductor Manufacturing Technology;Doering,2007

5. Principle and Application of Atomic Layer Deposition Technology;Li,2016

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