Near-Room-Temperature Thermal Chemical Vapor Deposition of Poly(chloro-p-xylylene)/SiO2 Nanocomposites
Author:
Affiliation:
1. Department of Materials Science and Engineering, Virginia Tech, 213 Holden Hall, Blacksburg, Virginia 24061-0237
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm990042q
Reference23 articles.
1. Vapor Deposition of Low-Dielectric-Constant Polymeric Thin Films
2. Poly(tetraflouro-p-xylylene), a low dielectric constant chemical vapor polymerized polymer
3. Nanoporous Silica as an Ultralow-k Dielectric
4. Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics
5. Room temperature copolymerization to improve the thermal and dielectric properties of polyxylylene thin films by chemical vapor deposition
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