Atomic Layer Deposition and Patterning of 15–185 nm Thick Al2O3 Films with Microplasma Arrays for Low-Temperature Growth and Sub-300 nm Lateral Feature Resolution
Author:
Affiliation:
1. Laboratory for Optical Physics and Engineering, Department of Electrical and Computer Engineering, University of Illinois, Urbana, Illinois 61801, United States
Funder
Defense Advanced Research Projects Agency
Jet Propulsion Laboratory
Air Force Office of Scientific Research
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsanm.9b02453
Reference52 articles.
1. Hybrid nanomaterials through molecular and atomic layer deposition: Top down, bottom up, and in-between approaches to new materials
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