Adsorption and surface reaction of isopropyl alcohol on SiO2 surfaces

Author:

Mawaki Takezo1ORCID,Teramoto Akinobu2ORCID,Ishii Katsutoshi3,Shiba Yoshinobu4,Kuroda Rihito1ORCID,Suwa Tomoyuki4,Azumo Shuji3,Shimizu Akira3,Umezawa Kota3,Shirai Yasuyuki4,Sugawa Shigetoshi4

Affiliation:

1. Graduate School of Engineering, Tohoku University, 6-6-11 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

2. Research Institute for Nanodevice and Bio Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8527, Japan

3. Tokyo Electron Technology Solutions Ltd., 650 Mitsuzawa, Hosaka-cho, Nirasaki, Yamanashi 407-0192, Japan

4. New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

Abstract

In this study, we investigated the adsorption and surface reaction of isopropyl alcohol (IPA) gas on silicon dioxide (SiO2) surfaces. The temperature dependence of the decomposition behavior of IPA and the effect on the SiO2 surface, such as reduction of SiO2 during IPA treatment, were studied. The chemical structures of the SiO2 surfaces before and after IPA treatment were analyzed by x-ray photoelectron spectroscopy (XPS). The decomposition behavior of IPA was investigated using an in-line evaluation system equipped with a SiO2 reactor and Fourier-transform infrared spectroscopy (FT-IR). During IPA treatment at temperatures above 150 °C, different types of organic matter were deposited on the SiO2 surfaces depending on the temperature. SiO2 was not reduced, and its surface states were not changed at temperatures below 350 °C. In addition, we investigated the amount of trimethylaluminium (TMAl) adsorbed on SiO2 surface with and without IPA treatment. As a result, the amount of TMAl adsorbed on SiO2 surface was reduced by about 25% by the IPA treatment. We found that the organic matter obtained by IPA treatment partially inhibited the adsorption of the TMAl gas on SiO2 surfaces. These findings will be useful for the use of IPA in the advanced semiconductor manufacturing such as in area-selective processes.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference26 articles.

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