Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1852079
Reference21 articles.
1. Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing
2. Electrical properties of RuO2 gate electrodes for dual metal gate Si-CMOS
3. Selective-area atomic layer epitaxy growth of ZnO features on soft lithography-patterned substrates
4. Self-assembled monolayer resist for atomic layer deposition of HfO2 and ZrO2 high-κ gate dielectrics
5. Selective Atomic Layer Deposition of Titanium Oxide on Patterned Self-Assembled Monolayers Formed by Microcontact Printing
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