In-Situ Synchrotron X-Ray Scattering Study of Thin Film Growth by Atomic Layer Deposition-Reference-Cited by-同舟云学术

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In-Situ Synchrotron X-Ray Scattering Study of Thin Film Growth by Atomic Layer Deposition

Published:2011-02-01 Issue:2 Volume:11 Page:1577-1580
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j nanosci nanotechnol

Author:

Park Yong Jun,Lee Dong Ryeol,Lee Hyun Hwi,Lee Han-Bo-Ram,Kim Hyungjun,Park Gye-Choon,Rhee Shi-Woo,Baik Sunggi

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Biocompatible Co-organic Composite Thin Film Deposited by VHF Plasma-Enhanced Atomic Layer Deposition at a Low Temperature;ACS Omega;2024-07-23

2. Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based in situ and operando atomic layer deposition research;Review of Scientific Instruments;2022-01-01

3. Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition;Review of Scientific Instruments;2016-11

4. Evolution of Crystal Structure During the Initial Stages of ZnO Atomic Layer Deposition;Chemistry of Materials;2016-01-14

5. Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation;Review of Scientific Instruments;2015-09

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