Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation-Reference-Cited by-同舟云学术

Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation

Published:2015-09 Issue:9 Volume:86 Page:095113
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Schroeder J. L.¹^ORCID,Thomson W.²,Howard B.²,Schell N.³,Näslund L.-Å.¹,Rogström L.¹,Johansson-Jõesaar M. P.⁴,Ghafoor N.¹,Odén M.¹,Nothnagel E.²,Shepard A.²,Greer J.²^ORCID,Birch J.¹

Affiliation:

1. Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping, Sweden

2. PVD Products Inc., 35 Upton Dr., Suite 200, Wilmington, Massachusetts 01887, USA

3. Helmholtz-Zentrum Geesthacht, Centre for Materials and Coastal Research, Institute for Materials Research, Max-Planck-Straße 1, 21502 Geesthacht, Germany

4. Seco Tools AB, Björnbacksvägen 2, SE-737 82 Fagersta, Sweden

Funder

Vetenskapsrådet (Swedish Research Council)

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4930243

Reference30 articles.

1. Experimental considerations for in situ X-ray scattering analysis of OMVPE growth

2. A miniature x‐ray compatible sputtering system for studying in situ high Tc thin film growth