A miniature x‐ray compatible sputtering system for studying in situ high Tc thin film growth-Reference-Cited by-同舟云学术

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A miniature x‐ray compatible sputtering system for studying in situ high Tc thin film growth

Published:1991-01 Issue:1 Volume:9 Page:128-132
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Zheng J. Q.,Shih M. C.,Wang X. K.,Williams S.,Dutta P.,Chang R. P. H.,Ketterson J. B.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577112

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation;Review of Scientific Instruments;2015-09

2. Nucleation and phase formation during reactive magnetron co-sputtering of Cu(In,Ga)S2 films, investigated by in situ EDXRD;Journal of Crystal Growth;2013-12

3. Modular deposition chamber forin situX-ray experiments during RF and DC magnetron sputtering;Journal of Synchrotron Radiation;2012-01-06

4. A magnetron sputter deposition chamber for in-situ investigation of multilayer film growth using a state of the art Laboratory Diffractometer;physica status solidi (a);2007-08

5. Crystalline hydroxyapatite thin films produced at room temperature — An opposing radio frequency magnetron sputtering approach;Thin Solid Films;2007-06

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