Analytical Current–Voltage Modeling and Analysis of the MFIS Gate-All-Around Transistor Featuring Negative-Capacitance

Abstract

Recently, in accordance with the demand for development of low-power semiconductor devices, a negative capacitance field-effect-transistor (NC-FET) that integrates ferroelectric material into a gate stack and utilizes negative capacitive behavior has been widely investigated. Furthermore, gate-all-around (GAA) architecture to reduce short-channel effect is expected to be applied after Fin-FET technology. In this work, we proposed a compact model describing current–voltage (I–V) relationships of an NC GAA-FET with interface trap effects for the first time, which is a simplified model by taking proper approximation in each operating region. This is a surface potential-based compact model, which is suitable for evaluating the I–V characteristics for each operating region. It was validated that the proposed model shows good agreement with the results of implicit numerical calculations. In addition, by using the proposed model, we explored the electrical properties of the NC GAA-FET by varying the basic design parameters such as ferroelectric thickness (tfe), intermediate insulator thickness (tox), silicon channel radius (R), and interface trap densities (Net).