Molecular depth profiling with reactive ions, or why chemistry matters in sputtering
Author:
Publisher
Wiley
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/sia.3528/fullpdf
Reference20 articles.
1. Preliminary evaluation of an SF5+ polyatomic primary ion beam for analysis of organic thin films by secondary ion mass spectrometry
2. TOF-SIMS Analysis Using C60. Effect of Impact Energy on Yield and Damage
3. Molecular Depth Profiling with Cluster Ion Beams
4. Quantitative Molecular Depth Profiling of Organic Delta-Layers by C60 Ion Sputtering and SIMS
5. Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams
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1. Sputtering Behavior of P3HT under Low-Energy Monoatomic Projectile Bombardment: Insights from Molecular Dynamics Simulations;The Journal of Physical Chemistry C;2023-08-08
2. Effects of Cs+ and Arn+ ion bombardment on the damage of graphite crystals;Applied Surface Science;2022-05
3. Depth Profiling of Organic Light-Emitting Diodes by ToF-SIMS Coupled with Wavelet–Principal Component Analysis;ACS Applied Polymer Materials;2019-05-30
4. ToF-SIMS Depth Profiling of Organic Delta Layers with Low-Energy Cesium Ions: Depth Resolution Assessment;Journal of the American Society for Mass Spectrometry;2019-05-06
5. Hybrid Perovskites Depth Profiling with Variable-Size Argon Clusters and Monatomic Ions Beams;Materials;2019-03-02
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