Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams-Reference-Cited by-同舟云学术

Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams

Published:2009-10-30 Issue:20 Volume:23 Page:3264-3268
ISSN:0951-4198
Container-title:Rapid Communications in Mass Spectrometry
language:en
Short-container-title:Rapid Commun. Mass Spectrom.

Author:

Ninomiya Satoshi,Ichiki Kazuya,Yamada Hideaki,Nakata Yoshihiko,Seki Toshio,Aoki Takaaki,Matsuo Jiro

Publisher

Wiley

Subject

Organic Chemistry,Spectroscopy,Analytical Chemistry

Reference27 articles.

1. Secondary ion emission from polymer surfaces under Ar+, Xe+ and SF5+ ion bombardment

2. Preliminary evaluation of an SF5+ polyatomic primary ion beam for analysis of organic thin films by secondary ion mass spectrometry

3. A C60 Primary Ion Beam System for Time of Flight Secondary Ion Mass Spectrometry: Its Development and Secondary Ion Yield Characteristics

4. Simultaneous Ejection of Two Molecular Ions from keV Gold Atomic and Polyatomic Projectile Impacts

5. Tissue Molecular Ion Imaging by Gold Cluster Ion Bombardment

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