Correlation of local strain and temperature measurements in confocal Raman microscopy-Reference-Cited by-同舟云学术

Correlation of local strain and temperature measurements in confocal Raman microscopy

Published:2021-03-18 Issue:6 Volume:52 Page:1123-1134
ISSN:0377-0486
Container-title:Journal of Raman Spectroscopy
language:en
Short-container-title:J Raman Spectrosc

Author:

Lubio Aura D.¹²^ORCID,Dörfler Andreas¹³,Plathier Julien¹,Dequivre Thomas²⁴,Kolhatkar Gitanjali¹⁵,Charlebois Serge A.²^ORCID,Ruediger Andreas¹

Affiliation:

1. Nanoelectronics‐Nanophotonics Institut National de la Recherche Scientifique Varennes Québec Canada

2. Institut interdisciplinaire d'innovation technologique (3IT), Department of Electrical Engineering and Information Technology University of Sherbrooke Sherbrooke Québec Canada

3. Department of Applied Sciences and Mechatronics Munich University of Applied Sciences Munich Germany

4. Business Development MiQro Innovation Collaborative Centre (C2MI) Bromont Québec Canada

5. Nanoelectronics, Faculty of Engineering Kiel University Kiel Germany

Publisher

Wiley

Subject

Spectroscopy,General Materials Science

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/jrs.6096

Reference60 articles.

1. Mechanical stress measurements using micro-Raman spectroscopy

2. Multiwavelength Raman characterization of silicon stress near through-silicon vias and its inline monitoring applications

3. Relation between Raman frequency and triaxial stress in Si for surface and cross-sectional experiments in microelectronics components

4. Micro-Raman spectroscopy to study local mechanical stress in silicon integrated circuits

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