Growth and Properties of Intentionally Carbon‐Doped GaN Layers

Author:

Richter Eberhard1ORCID,Beyer Franziska C.2,Zimmermann Friederike2,Gärtner Günter3,Irmscher Klaus4,Gamov Ivan4,Heitmann Johannes2,Weyers Markus1,Tränkle Günther1

Affiliation:

1. Ferdinand‐Braun‐Institut Leibniz‐Institut für Höchstfrequenztechnik Gustav‐Kirchhoff‐Str. 4 12489 Berlin Germany

2. Institute of Applied Physics TU Bergakademie Freiberg 09599 Freiberg Germany

3. Institute of Experimental Physics TU Bergakademie Freiberg 09599 Freiberg Germany

4. Leibniz‐Institut für Kristallzüchtung Max‐Born‐Strasse 2 12489 Berlin Germany

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Reference34 articles.

1. a)https://www.nobelprize.org/uploads/2018/06/press-25.pdf(accessed: May 2019); b)http://www.semiconductor-today.com/news_items/2019/jan/yole_030119.shtml(accessed: May 2019); c)Yole Développement RF GaN Market: Applications Players Technology and Substrates 2019 Market & Technology Report May2019.

2. Influence of MOVPE growth conditions on carbon and silicon concentrations in GaN

3. Roles of lightly doped carbon in the drift layers of vertical n-GaN Schottky diode structures on freestanding GaN substrates

4. Correlation between mobility collapse and carbon impurities in Si-doped GaN grown by low pressure metalorganic chemical vapor deposition

5. Initial leakage current paths in the vertical-type GaN-on-GaN Schottky barrier diodes

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