Influence of MOVPE growth conditions on carbon and silicon concentrations in GaN
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference84 articles.
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2. Semiconductors and Semimetals, Metalorganic chemical vapor deposition (MOCVD) of Group III Nitrides;DenBaars,1998
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4. Lateral epitaxy of low defect density GaN layers via organometallic vapor phase epitaxy
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