Optical metasurfaces made by cell projection lithography
Author:
Affiliation:
1. Vistec Electron Beam GmbH Ilmstrasse 4 07743 Jena Germany
2. Fraunhofer Institute of Applied Optics and Precision Engineering Albert‐Einstein‐Straβe 7 07745 Jena Germany
Publisher
Wiley
Subject
General Materials Science
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/phvs.202200036
Reference3 articles.
1. Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterning
2. U.Huebner M.Falkner U. D.Zeitner M.Banasch K.Dietrich E.-B.Kley:Multi-stencil character projection e-beam lithography: a fast and flexible way for high quality optical metamaterials. 30th European Mask and Lithography Conference. Vol. 9231. SPIE 2014.
3. Polarization Control by Deep Ultra Violet Wire Grid Polarizers
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