Wafer-scale nanofabrication of sub-5 nm gaps in plasmonic metasurfaces-Reference-Cited by-同舟云学术

Wafer-scale nanofabrication of sub-5 nm gaps in plasmonic metasurfaces

Published:2024-08-28 Issue: Volume: Page:
ISSN:2192-8606
Container-title:Nanophotonics
language:en
Short-container-title:

Author:

Gour Jeetendra¹^ORCID,Beer Sebastian¹^ORCID,Paul Pallabi¹^ORCID,Alberucci Alessandro¹^ORCID,Steinert Michael¹^ORCID,Szeghalmi Adriana²^ORCID,Siefke Thomas¹²^ORCID,Peschel Ulf³^ORCID,Nolte Stefan¹²^ORCID,Zeitner Uwe Detlef¹²⁴^ORCID

Affiliation:

1. Friedrich Schiller University Jena, Faculty of Physics and Astronomy , Abbe Center of Photonics, Institute of Applied Physics , Albert-Einstein-Str. 15, 07745 Jena , Germany

2. Fraunhofer Institute for Applied Optics and Precision Engineering IOF , Albert-Einstein-Str. 7, 07745 Jena , Germany

3. Faculty of Physics and Astronomy , Friedrich Schiller University Jena, Institute of Solid State Theory and Optics , Max-Wien-Platz 1, 07743 Jena , Germany

4. HM Hochschule München University of Applied Sciences , Department of Applied Sciences and Mechatronics , Loristr. 19, 80335 Munich , Germany

Abstract

Abstract In the rapidly evolving field of plasmonic metasurfaces, achieving homogeneous, reliable, and reproducible fabrication of sub-5 nm dielectric nanogaps is a significant challenge. This article presents an advanced fabrication technology that addresses this issue, capable of realizing uniform and reliable vertical nanogap metasurfaces on a whole wafer of 100 mm diameter. By leveraging fast patterning techniques, such as variable-shaped and character projection electron beam lithography (EBL), along with atomic layer deposition (ALD) for defining a few nanometer gaps with sub-nanometer precision, we have developed a flexible nanofabrication technology to achieve gaps as narrow as 2 nm in plasmonic nanoantennas. The quality of our structures is experimentally demonstrated by the observation of resonant localized and collective modes corresponding to the lattice, with Q-factors reaching up to 165. Our technological process opens up new and exciting opportunities to fabricate macroscopic devices harnessing the strong enhancement of light–matter interaction at the single nanometer scale.

Funder

Deutsche Forschungsgemeinschaft

Publisher

Walter de Gruyter GmbH

Link

https://www.degruyter.com/document/doi/10.1515/nanoph-2024-0343/pdf

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