Designing Wake‐Up Free Ferroelectric Capacitors Based on the HfO 2 /ZrO 2 Superlattice Structure
Author:
Affiliation:
1. School of Integrated Circuits School of Optical and Electronic Information Huazhong University of Science and Technology Wuhan 430074 China
2. Hubei Yangtze Memory Laboratories Wuhan 430205 China
Funder
National Key Research and Development Program of China
National Natural Science Foundation of China
Publisher
Wiley
Subject
Electronic, Optical and Magnetic Materials
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/aelm.202200737
Reference52 articles.
1. Stabilizing Remanent Polarization during Cycling in HZO‐Based Ferroelectric Device by Prolonging Wake‐up Period
2. ZrO2 Ferroelectric FET for Non-volatile Memory Application
3. Charge-Trapping Phenomena in HfO2-Based FeFET-Type Nonvolatile Memories
4. Ferroelectric HfO2 Memory Transistors With High-κ Interfacial Layer and Write Endurance Exceeding 1010 Cycles
5. Blocking of Conducting Channels Widens Window for Ferroelectric Resistive Switching in Interface‐Engineered Hf 0.5 Zr 0.5 O 2 Tunnel Devices
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2. In Situ Modulation of Oxygen Vacancy Concentration in Hf0.5Zr0.5O2−x Thin Films and the Mechanism of Its Impact on Ferroelectricity;Coatings;2024-09-02
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