Atomic Layer Deposition for the Photoelectrochemical Applications-Reference-Cited by-同舟云学术

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Atomic Layer Deposition for the Photoelectrochemical Applications

Published:2021-02-24 Issue:7 Volume:8 Page:2002100
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Pastukhova Nadiia¹²,Mavrič Andraž¹³,Li Yanbo¹^ORCID

Affiliation:

1. Institute of Fundamental and Frontier Sciences University of Electronic Science and Technology of China Chengdu 610054 China

2. Laboratory of Organic Matter Physics University of Nova Gorica Nova Gorica SI‐5000 Slovenia

3. Materials Research Laboratory University of Nova Gorica Nova Gorica SI‐5000 Slovenia

Funder

National Natural Science Foundation of China

Javna Agencija za Raziskovalno Dejavnost RS

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.202002100

Reference169 articles.

1. Atomic Layer Deposition

2. Mini Review on Gas-Phase Synthesis for Energy Nanomaterials

3. Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

4. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

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