Novolac-based resists
Author:
Publisher
Wiley
Subject
General Chemical Engineering,Electronic, Optical and Magnetic Materials
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1. High volume manufacturing of optical MEMS devices using biomass nano-patterning materials and ecofriendly developable lithography processes;Environmental Effects on Light Propagation and Adaptive Systems;2018-10-09
2. Effects of phenolic compound addition to fractionated Novolak-based resists to improve resolution capability(2);SPIE Proceedings;2017-03-27
3. Patterned masking using polymers: insights and developments from silicon photovoltaics;International Materials Reviews;2016-06-30
4. Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography;Applied Physics Express;2016-04-15
5. Enhancing the Novolak resin resist resolution by adding phenol to fractionated resin;SPIE Proceedings;2016-03-25
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