Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/9/i=5/a=056501/pdf
Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Enhanced photonic nanojets for submicron patterning;Journal of Central South University;2022-10
2. Thermal nanoimprint lithography of sodium hyaluronate solutions with gas permeable inorganic hybrid mold for cosmetic and pharmaceutical applications;Applied Physics Express;2022-03-21
3. Effect of V-Groove Surface Pattern on the Tribological Properties of Epoxy;Tribology Transactions;2020-12-14
4. Comparison of gas permeable mold with acryl substituents for silver nano-paste imprint patterning;Microelectronic Engineering;2019-08
5. Development of Cellulose Derivative Mold for Imprint Lithography;Journal of Photopolymer Science and Technology;2019-06-24
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