Effects of phenolic compound addition to fractionated Novolak-based resists to improve resolution capability(2)
Author:
Affiliation:
1. Litho Tech Japan Co., Ltd. (Japan)
2. Toyama Prefectural Univ. (Japan)
3. Merck Performance Materials Manufacturing G.K. (Japan)
Publisher
SPIE
Reference13 articles.
1. Standing-wave Effect in Photoresist with and without HMDS
2. Relationship between Dissolution Property and Molecular Weight of Positive-tone Novolak Resist
3. Relationship between the Development Property and the Photo Active Compound Contents of the Positive-Tone Novolak Resist;Nakao,2010
4. Study of the lithography characteristics of novolak resist at different PAC concentrations;Sekiguchi,2012
5. Advanced Materials for Optics and Electronics
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1. Study of lithographic characteristics due to differences in novolac resin structure;Advances in Patterning Materials and Processes XXXVII;2020-03-23
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