Author:
Sekiguchi Atsushi,Matsumoto Yoko,Tanaka Hatsuyuki,Horiuchi Toshiyuki,Sensu Yoshihisa,Takei Satoshi,Hanabata Makoto
Reference13 articles.
1. Standing-wave Effect in Photoresist with and without HMDS
2. Relationship between Dissolution Property and Molecular Weight of Positive-tone Novolak Resist
3. Relationship between the Development Property and the Photo Active Compound Contents of the Positive-Tone Novolak Resist;Akichika,2010
4. Study of the lithography characteristics of novolak resist at different PAC concentrations;Sekiguchi,2012
5. Novolak-based Resists, Advanced Materialfor Optics and Electronics;Hanabata,1994
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献