Remote Plasma Deposited Silicon Dioxide-Like Film Densification by Means of RF Substrate Biasing: Film Chemistry and Morphology
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Reference17 articles.
1. Critical ion energy and ion flux in the growth of films by plasma‐enhanced chemical‐vapor deposition
2. Plasma treatment of porous SiNx:H films for the fabrication of porous-dense multilayer optical filters with tailored interfaces
3. Plasma deposition of optical films and coatings: A review
4. Quality improvement of plasma-beam-deposited amorphous hydrogenated carbon with higher growth rate
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