Review of infrared spectroscopy techniques for the determination of internal structure in thin SiO2 films-Reference-Cited by-同舟云学术

Review of infrared spectroscopy techniques for the determination of internal structure in thin SiO2 films

Published:2021-05 Issue: Volume:114 Page:103256
ISSN:0924-2031
Container-title:Vibrational Spectroscopy
language:en
Short-container-title:Vibrational Spectroscopy

Author:

de los Arcos Teresa^ORCID,Müller Hendrik^ORCID,Wang Fuzeng^ORCID,Damerla Varun Raj^ORCID,Hoppe Christian,Weinberger Christian^ORCID,Tiemann Michael,Grundmeier Guido

Funder

Deutsche Forschungsgemeinschaft

Publisher

Elsevier BV

Subject

Spectroscopy

Reference59 articles.

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3. Effect of heat treatment on the nanoporosity of silica PECVD films elucidated by low-energy positron annihilation and ellipsometric porosimetry;Yoshimoto;J. Appl. Phys.,2017

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5. Tuning mesoporous silica film accessibility through controlled dissolution in NH 4 F: investigation of structural change by ellipsometry porosimetry and X-ray reflectivity;Loizillon;J. Phys. Chem. C,2019

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