On the Plasma Chemistry of CH4H2Ar System Relevant to Diamond Deposition Process by Plasma Enhanced Chemical Vapor Deposition
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
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1. Methane chemistry involved in a low-pressure electron cyclotron wave resonant plasma discharge
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1. The Determination of Deposition Parameters for Carbon-Based Materials in an Inductively Coupled Plasma System Using COMSOL;IEEE Transactions on Plasma Science;2022-12
2. Diamond;Single Crystals of Electronic Materials;2019
3. Numerical Analysis of Substrate-Incident Carbon Flux in Low-Pressure Radio-Frequency CH4Plasmas for Deposition of Diamond-Like Carbon Films;Electronics and Communications in Japan;2015-08-10
4. Synthesis, structural and field emission properties of multiwall carbon nanotube-graphene-like nanocarbon hybrid films grown by microwave plasma enhanced chemical vapor deposition;Materials Chemistry and Physics;2015-04
5. An Insight into Grain Refinement Mechanism of Ultrananocrystalline Diamond Films Obtained by Direct Current Plasma-Assisted Chemical Vapor Deposition;Plasma Processes and Polymers;2014-03-03
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