Numerical Analysis of Substrate-Incident Carbon Flux in Low-Pressure Radio-Frequency CH4Plasmas for Deposition of Diamond-Like Carbon Films
Author:
Affiliation:
1. Chiba Institute of Technology; 2-17-1, Tsudanuma Narashino City 275-0016 Japan
2. Nagoya University, Furo-cho; Chikusa-ku Nagoya 464-0814 Japan
Publisher
Wiley
Subject
Applied Mathematics,Electrical and Electronic Engineering,Computer Networks and Communications,General Physics and Astronomy,Signal Processing
Reference25 articles.
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3. Diamond-like amorphous carbon;Robertson;Mat Sci Eng,2002
4. Pulsed PECVD deposition of diamond-like carbon films;Fedosenko;Diamond Relat Mater,2002
5. Low-temperature plasma processing of materials: past, present, and future;d'Agostino;Plasma Process Polym,2005
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1. Mass Spectrometric Study on Ions and Radicals in Tetramethylsilane Plasma for Si-containing Diamond-Like Carbon Coating;IEEJ Transactions on Fundamentals and Materials;2022-06-01
2. Investigation of the Growth of Carbon Films by Ar/CH4 Plasma Jet Driven by 100-MHz/100-kHz Dual Frequency Source at Atmospheric Pressure;IEEE Transactions on Plasma Science;2020-04
3. Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition;C;2019-01-24
4. Characteristics of sub-atmospheric pressure glow discharge plasmas for preparation of a-C:H films;Vacuum;2017-02
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