Mass Spectrometric Study on Ions and Radicals in Tetramethylsilane Plasma for Si-containing Diamond-Like Carbon Coating
Author:
Affiliation:
1. Chiba Institute of Technology
2. Innovation Science Co., Ltd.
3. Gifu University
4. Meijo University
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering
Link
https://www.jstage.jst.go.jp/article/ieejfms/142/6/142_269/_pdf
Reference33 articles.
1. (1) K. Bewilogua and D. Hofmann : “History of diamond-like carbon films: From first experiments to worldwide applications”, Surf. Coat. Technol., Vol. 242, pp. 214-225 (2014)
2. (2) 斎藤秀俊 監修:DLC膜ハンドブック, (株)NTS (2006)
3. (3) S. Aisenberg and R. Chabot : “Ion-Beam Deposition of Thin Films of Diamondlike Carbon”, J. Appl. Phys., Vol. 42, pp. 2953-2958 (1971)
4. (4) A. Oda and H. Kousaka : “Numerical Analysis of Substrate-Incident Carbon Flux in Low-Pressure Radio-Frequency CH4 Plasmas for Deposition of Diamond-Like Carbon Films”, Electron. Commun. Jpn., Vol. 98, No. 9, pp. 31-39 (2015)
5. (5) 森 広行・高橋直子・中西和之・太刀川英男・大森俊英:「大気中無潤滑下におけるDLC-Si膜の低摩擦特性」, 表面技術, Vol. 59, No. 6, pp. 401-407 (2008)
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