Onset of flow recirculation in vertical rotating-disc chemical vapor deposition reactors
Author:
Affiliation:
1. Dept. of Chemical Engineering; University of Massachusetts; Amherst; MA; 01003
Publisher
Wiley
Subject
General Chemical Engineering,Environmental Engineering,Biotechnology
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/aic.14179/fullpdf
Reference22 articles.
1. Mathematics in Chemical Engineering: A 50 year introspection;Ramkrishna;AIChE J.,2004
2. Metal organic vapor phase growth of complex semiconductor alloys;Kuech;AIP Conf Proc.,2010
3. Flow phenomena in chemical vapor deposition of thin films;Jensen;Ann Rev Fluid Mech.,1991
4. Multi-scale modeling of chemical vapor deposition processes for thin film technology;Kleijn;J Cryst Growth.,2007
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