Numerical investigation of multiple stationary and time-periodic flow regimes in vertical rotating disc CVD reactors
Author:
Funder
Dr. N. Cheimarios and I. Aviziotis
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference22 articles.
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2. Process conditions optimization for the maximum deposition rate and uniformity in vertical rotating disc MOCVD reactors based on CFD modeling;Mitrovic;J. Cryst. Growth,2007
3. Flow regime map and deposition rate uniformity in vertical rotating-disk OMVPE reactors;Bibel;J. Cryst. Growth,1992
4. , Particle image velocimetry measurement of jet impingement in a cylindrical chamber with a heated rotating disk;Liu;Int. J. Heat Mass Transf.,2013
5. Onset of flow recirculation in vertical rotating-disc chemical vapor deposition reactors;Cho;AICHE J.,2013
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