An efficient chemistry-enhanced CFD model for the investigation of the rate-limiting mechanisms in industrial Chemical Vapor Deposition reactors-Reference-Cited by-同舟云学术

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An efficient chemistry-enhanced CFD model for the investigation of the rate-limiting mechanisms in industrial Chemical Vapor Deposition reactors

Published:2022-10 Issue: Volume:186 Page:314-325
ISSN:0263-8762
Container-title:Chemical Engineering Research and Design
language:en
Short-container-title:Chemical Engineering Research and Design

Author:

Papavasileiou Paris,Koronaki Eleni D.,Pozzetti Gabriele,Kathrein Martin,Czettl Christoph,Boudouvis Andreas G.,Mountziaris T.J.,Bordas Stéphane P.A.

Funder

H2020 Marie Skłodowska-Curie Actions

University of Houston

Fonds National de la Recherche Luxembourg

Université du Luxembourg

Horizon 2020

Horizon 2020 Framework Programme

Publisher

Elsevier BV

Subject

General Chemical Engineering,General Chemistry

Reference42 articles.

1. Al2O3 thin films prepared by plasma-enhanced chemical vapor deposition of dimethylaluminum isopropoxide;Ban;Thin Solid Films,2017

2. Experimental study of the effect of coating thickness and substrate roughness on tool wear during turning;Bar-Hen;Tribol. Int.,2017

3. Numerical model of carbon chemical vapor deposition at internal surfaces;Barua;Vacuum,2020

4. Understanding the catalytic effects of H2S on CVD-growth of α-alumina: thermodynamic gas-phase simulations and density functional theory;Blomqvist;Surf. Coat. Technol.,2011

5. High-temperature kinetics of the homogeneous reverse water-gas shift reaction;Bustamante;AIChE J.,2004

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