Multi-scale modeling of chemical vapor deposition processes for thin film technology-Reference-Cited by-同舟云学术

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Multi-scale modeling of chemical vapor deposition processes for thin film technology

Published:2007-05 Issue:1 Volume:303 Page:362-380
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Kleijn C.R.,Dorsman R.,Kuijlaars K.J.,Okkerse M.,van Santen H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference186 articles.

1. Micro-reaction engineering applications of reaction engineering to processing of electronic and photonic materials

2. Thin Film Processes II,1991

3. Chemical Vapor Deposition—Principles and Applications,1993

4. The Chemistry of Metal CVD;Kodas,1994

5. CVD of Nonmetals,1996

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