Preparation of Neutral Wetting Brushes for Block Copolymer Films from Homopolymer Blends
Author:
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Reference63 articles.
1. Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication
2. Nanoscale patterning using self-assembled polymers for semiconductor applications
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5. Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography
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