Controlled Orientation of Plasma-Treated Diblock Copolymer Films from the Responsive Functionalized Substrate through Solvent Annealing
Author:
Affiliation:
1. Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
2. Department of Materials Science Engineering, University of Ioannina, University Campus, Ioannina 45110, Greece
Funder
National Science and Technology Council
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.3c01056
Reference41 articles.
1. Block Copolymer Thermodynamics: Theory and Experiment
2. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter
3. Enabling nanotechnology with self assembled block copolymer patterns
4. Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene−Polydimethylsiloxane Block Copolymer
5. Inorganic Gyroid with Exceptionally Low Refractive Index from Block Copolymer Templating
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