A Universal Approach to Fabricating 3D Chemical Patterns for Directed Self-Assembly of Block Copolymers with Density Multiplication
Author:
Affiliation:
1. Institute for Advanced Study, Shenzhen University, Shenzhen 518052, Guangdong, China
2. Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
Funder
Science, Technology and Innovation Commission of Shenzhen Municipality
National Natural Science Foundation of China
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.3c00417
Reference41 articles.
1. Directed Self-Assembly of Styrene-Methyl Acrylate Block Copolymers with Sub-7 nm Features via Thermal Annealing
2. Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae
3. Nanotransfer Printing with sub-10 nm Resolution Realized using Directed Self-Assembly
4. Macroscopic 10-Terabit–per–Square-Inch Arrays from Block Copolymers with Lateral Order
5. Nanostructures and Functional Materials Fabricated by Interferometric Lithography
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