Width-Dependent Sheet Resistance of Nanometer-Wide Si Fins as Measured with Micro Four-Point Probe-Reference-Cited by-同舟云学术

Width-Dependent Sheet Resistance of Nanometer-Wide Si Fins as Measured with Micro Four-Point Probe

Published:2017-12-07 Issue:6 Volume:215 Page:1700857
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Bogdanowicz Janusz¹,Folkersma Steven¹²,Sergeant Stefanie¹,Schulze Andreas¹,Moussa Alain¹,Petersen Dirch H.³,Hansen Ole³,Henrichsen Henrik H.⁴,Nielsen Peter F.⁴,Vandervorst Wilfried¹²

Affiliation:

1. IMEC; Kapeldreef 75 B-3000 Leuven Belgium

2. Instituut voor Kern-en Stralingsfysika, KU Leuven; Celestijnenlaan 200D B-3001 Leuven Belgium

3. Department of Micro- and Nanotechnology Technical University of Denmark; DTU Nanotech Building 345 East DK-2800 Kgs. Lyngby Denmark

4. CAPRES A/S, Scion-DTU; Building 373 DK-2800 Kgs. Lyngby Denmark

Funder

European Union's Horizon 2020 research and innovation program

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. http://newsroom.intel.com/docs/DOC-2032#pressmaterials 2011

2. Dopant, composition and carrier profiling for 3D structures

3. Influence of the Si/SiO2 interface on the charge carrier density of Si nanowires

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