Damage and recovery by electron and ion beam irradiation during AES analysis of silicon oxynitrides
Author:
Publisher
Wiley
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference15 articles.
1. AES Investigation of the Chemical Structure of Plasma‐Deposited Silicon Nitride
2. An Attempt at the AES Evaluation of the Composition of Off‐Stoichiometric Silicon Nitride
3. Electron and ion beam degradation effects in AES analysis of silicon nitride thin films
4. Electron and ion beam effects in amorphous SiO2and Si3N4films for electronic devices
5. Auger electron spectroscopy studies of silicon nitride, oxide, and oxynitride thin films: Minimization of surface damage by argon and electron beams
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