Electron and ion beam effects in amorphous SiO2and Si3N4films for electronic devices
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337578208216824
Reference13 articles.
1. Hezel, R., Schorner, R. and Meisel, T. Proc. Third E.C. Photovoltaic Solar Energy Conf. Cannes. pp.866Dordrecht: Reidel. 1980
2. Silicon nitride for the improvement of silicon inversion layer solar cells
3. Irradiation of MIS Capacitors with High Energy Electrons
4. Electron-beam-induced-current investigations on MOS and MNOS devices
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